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Back-illuminated image sensor and method of fabric

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专利名称:Back-illuminated image sensor and method

of fabricating the same

发明人:Sung-Ho Hwang,Duck-Hyung Lee,Chang-Rok

Moon,Doo-Won Kwon

申请号:US11987607申请日:20071203公开号:US07750280B2公开日:20100706

专利附图:

摘要:A back-illuminated image sensor may include a substrate in which photodiodesare disposed; an insulating layer on a first surface of the substrate; an interconnection

layer in the insulating layer; an anti-reflection layer between the substrate and theinsulating layer; a plurality of color filters on a second surface of the substrate oppositeto the first surface; and a microlens on the color filters. Because the anti-reflection layermay be between the substrate and an interlayer dielectric layer, the reflection rate oflight that passes through the substrate and arrives at an interface between the substrateand the interlayer insulating layer may be reduced.

申请人:Sung-Ho Hwang,Duck-Hyung Lee,Chang-Rok Moon,Doo-Won Kwon

地址:Seoul KR,Seongnam-si KR,Seoul KR,Seongnam-si KR

国籍:KR,KR,KR,KR

代理机构:Harness, Dickey & Pierce, L.L.C.

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